Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.ErlangenTED
Clustertool for Ion Beam Etching of 300mm wafers
The tender item is an ion beam etching process tool to be used for 300mm wafer fabrication at the FRAUNHOFER IPMS. The systems will be used for the processing of CMOS wafers in a cleanroom class 1000 (approximately class 6 EN ISO 14644-1) production environment. Therefore, it is necessary to fulfill require-ments regarding metal contamina...
Type: Tender
Measurement Technology, Process Technology
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Content at a glance
- Tender type:
- Tender
- Contracting authority:
- Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Published:
- July 09, 2026
- Deadline:
- Not specified
- Topic:
- Measurement Technology
Tender description
The tender item is an ion beam etching process tool to be used for 300mm wafer fabrication at the FRAUNHOFER IPMS. The systems will be used for the processing of CMOS wafers in a cleanroom class 1000 (approximately class 6 EN ISO 14644-1) production environment. Therefore, it is necessary to fulfill require-ments regarding metal contamination and particle generation compatible with industry standards.
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