Universiteit TwenteEnschedeTED
European Tender Electron Beam Lithography system
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applica...
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Content at a glance
- Tender type:
- Tender
- Contracting authority:
- Universiteit Twente
- Published:
- June 14, 2026
- Deadline:
- August 14, 2026
Tender description
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
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- The submission deadline is 14. August 2026.
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- The contracting authority is Universiteit Twente.
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